Ultra-high vacuum (UHV) is the vacuum regime characterized by pressures lower than approx. 10–9 mbar (or 10-7 Pa). Ultra-high vacuum conditions are required for many surface analytical techniques, such as x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), Secondary ion mass spectrometry (SIMS) or Field Emission Microscopy (FEM). Also, thin film growth and manufacturing techniques with strict purity requirements, such as molecular beam epitaxy (MBE) and atomic layer deposition (ALD), are dependent on UHV conditions.
Leybold offers a wide range of advanced vacuum solutions for use in ambitious ultra-high vacuum applications. Their components, system solutions and after-sales service have shown their benefits in major research centers around the world.